| 日期-ID |
圖 片 |
設(shè)備名稱 |
制造商 |
型號(hào) |
年份 |
報(bào)價(jià)(￥) |
詳細(xì)配置 |
狀 態(tài) |
| 10.14-1560 |
 |
AMAT P5000干法刻蝕機(jī) |
AMAT |
P5000 |
1995/1999/ |
電話+微信咨詢 |
設(shè)備完整不缺件,有3臺(tái)現(xiàn)貨; |
國(guó)內(nèi)
|
| 10.14-1561 |
|
AMAT P5000化學(xué)氣相沉積機(jī) |
AMAT |
P5000 |
1998/1999/ |
電話+微信咨詢 |
設(shè)備完整不缺件,有6臺(tái)現(xiàn)貨; |
國(guó)內(nèi)
|
| 9.17-3925 |
 |
AMAT P5000刻蝕機(jī) |
AMAT |
P5000 |
1996 |
電話+微信咨詢 |
6"設(shè)備完整不缺件,3腔; |
國(guó)內(nèi)
|
| 8.17-1035 |
|
AMAT MRC MARKII金屬濺鍍機(jī) |
AMAT |
MRC MARKII |
2019 |
電話+微信咨詢 |
設(shè)備完整不缺件; |
國(guó)內(nèi)
|
| 8.17-1049 |
|
AMAT P5000 CVD氮化硅/氧化硅沉積設(shè)備 |
AMAT |
P5000 |
2019 |
電話+微信咨詢 |
設(shè)備完整不缺件; |
國(guó)內(nèi)
|
| 8.17-1055 |
|
AMAT MRC STAR金屬濺鍍機(jī) |
AMAT |
MRC STAR |
2019 |
電話+微信咨詢 |
設(shè)備完整不缺件; |
國(guó)內(nèi)
|
| 8.17-1026 |
|
AMAT P5000金屬Ti/AI/Ni蝕刻機(jī) |
AMAT |
P5000 |
2019 |
電話+微信咨詢 |
設(shè)備完整不缺件; |
國(guó)內(nèi)
|
| 8.17-1057 |
|
AMAT P5000 Poly SiO2/SIN蝕刻機(jī) |
AMAT |
P5000 |
2019 |
電話+微信咨詢 |
設(shè)備完整不缺件; |
國(guó)內(nèi)
|
| 8.13-2391 |
|
AMAT P5000刻蝕機(jī) |
AMAT |
P5000 |
- |
電話+微信咨詢 |
設(shè)備完整不缺件,1 CVD+1蝕刻; |
國(guó)外
|
| 7.30-4621 |
|
AMAT VIISta HC離子注入機(jī) |
AMAT |
VIISta HC |
- |
電話+微信咨詢 |
設(shè)備完整不缺件； |
國(guó)外
|
| 7.30-4638 |
|
AMAT ENDURA HP氣相沉積設(shè)備 |
AMAT |
ENDURA HP |
2004 |
電話+微信咨詢 |
8"設(shè)備完整不缺件,有2臺(tái)現(xiàn)貨; |
國(guó)外
|
| 7.30-4595 |
|
AMAT Centura-DPS刻蝕機(jī) |
AMAT |
Centura-DPS |
2007 |
電話+微信咨詢 |
12"設(shè)備完整不缺件; |
國(guó)外
|
| 7.30-4574 |
|
AMAT Reflexion miniship LK機(jī)械拋光設(shè)備 |
AMAT |
Reflexion miniship LK |
- |
電話+微信咨詢 |
12"設(shè)備完整不缺件; |
國(guó)外
|
| 7.30-4581 |
|
AMAT Centura WxZ刻蝕機(jī) |
AMAT |
Centura WxZ |
2000 |
電話+微信咨詢 |
設(shè)備完整不缺件; |
國(guó)外
|
| 7.30-4582 |
|
AMAT Producer GT CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer GT Chamber |
- |
電話+微信咨詢 |
12"設(shè)備完整不缺件; |
國(guó)外
|
| 7.30-4594 |
|
AMAT Centura AP-DPS刻蝕機(jī) |
AMAT |
Centura AP-DPS |
2005 |
電話+微信咨詢 |
12"設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4308 |
|
AMAT Centura Etch Enabler 300 2蝕刻機(jī) |
AMAT |
Centura Etch Enabler 300 2 |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4339 |
|
AMAT RTP XE CENTURA退火爐 |
AMAT |
RTP XE CENTURA |
- |
電話+微信咨詢 |
200mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4335 |
|
AMAT VIISTA HC 大束流離子注入機(jī) |
AMAT |
VIISTA HC |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4334 |
|
AMAT VIISTA HC 大束流離子注入機(jī) |
AMAT |
VIISTA HC |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4316 |
|
AMAT G5-MESA蝕刻機(jī) |
AMAT |
G5-MESA |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4315 |
|
AMAT G5-MESA蝕刻機(jī) |
AMAT |
G5-MESA |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4314 |
|
AMAT G5-MESA蝕刻機(jī) |
AMAT |
G5-MESA |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4313 |
|
AMAT G5-MESA蝕刻機(jī) |
AMAT |
G5-MESA |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4309 |
|
AMAT Centura Etch Enabler 300 2蝕刻機(jī) |
AMAT |
Centura Etch Enabler 300 2 |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4312 |
|
AMAT G5-MESA蝕刻機(jī) |
AMAT |
G5-MESA |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4235 |
|
AMAT RF3 涂膠顯影機(jī) |
AMAT |
RF3 |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4457 |
|
AMAT Vantage_AP擴(kuò)散爐 |
AMAT |
Vantage_AP |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4391 |
|
AMAT Endura-CL (MOCVD)化學(xué)氣相沉積設(shè)備 |
AMAT |
Endura-CL (MOCVD) |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4285 |
|
AMAT Raider ECD310電化學(xué)沉積設(shè)備 |
AMAT |
Raider ECD310 |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4277 |
|
AMAT CenturaHDP 5300Omega干式蝕刻機(jī) |
AMAT |
CenturaHDP→
5300Omega |
- |
電話+微信咨詢 |
200mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4257 |
|
AMAT UVISION4缺陷檢測(cè)工具 |
AMAT |
UVISION4 |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4253 |
|
AMAT HTF-Centura EPI外延沉積設(shè)備 |
AMAT |
HTF-Centura EPI |
- |
電話+微信咨詢 |
200mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4301 |
|
AMAT Centura Enabler蝕刻機(jī) |
AMAT |
Centura Enabler |
- |
電話+微信咨詢 |
300mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4202 |
|
AMAT CENTURE MXP刻蝕機(jī) |
AMAT |
CENTURE MXP |
- |
電話+微信咨詢 |
200mm設(shè)備完整不缺件; |
國(guó)外
|
| 7.18-4254 |
|
AMAT HTF-Centura EPI外延沉積設(shè)備 |
AMAT |
HTF-Centura EPI |
- |
電話+微信咨詢 |
200mm設(shè)備完整不缺件; |
國(guó)外
|
| 4.25-1698 |
 |
AMAT P5000刻蝕機(jī) |
AMAT應(yīng)用材料 |
P5000 |
- |
電話+微信咨詢 |
設(shè)備完整不缺件,有4臺(tái)現(xiàn)貨; |
國(guó)內(nèi)
|
| 4.3-4111 |
 |
AMAT P5000 PECVD刻蝕機(jī) |
AMAT |
P5000 |
1996 |
電話+微信咨詢 |
6" 2腔:SiO2+Si3N4,設(shè)備在美國(guó)已翻新,隨時(shí)發(fā)回國(guó)內(nèi); |
國(guó)外
|
| 4.3-4110 |
|
AMAT P5000 DRY ETCH刻蝕機(jī) |
AMAT |
P5000 |
1999 |
電話+微信咨詢 |
6" 2腔: Chamber A =MxP Poly(or Metal Etch/Trench Etch),Chamber B = MxP Poly,設(shè)備在美國(guó)已翻新,隨時(shí)發(fā)回國(guó)內(nèi); |
國(guó)外
|
| 2.12-4160 |
 |
AMAT Endura 5500 MOCVD氣相沉積設(shè)備 |
AMAT |
Endura 5500 |
1996 |
電話+微信咨詢 |
6"PVD System,
Can be converted to 8"
Chamber 1: AlSiCu
Chamber 2: Tin 101
Chamber 3: Ti/Tin
Chamber 4: Ti/Tin
Cha |
國(guó)外
|
| 6.25-4024 |
 |
AMAT mirra MESA CMP化學(xué)機(jī)械拋光設(shè)備 |
AMAT |
mirra MESA CMP |
2002 |
電話+微信咨詢 |
設(shè)備完整不缺件,已翻新在國(guó)內(nèi); |
國(guó)外
|
| 6.23-4021 |
 |
AMAT Endura II氣相沉積設(shè)備 |
AMAT |
Endura II |
- |
電話+微信咨詢 |
有2臺(tái)現(xiàn)貨; |
國(guó)內(nèi)
|
| 6.23-4020 |
 |
AMAT Endura CL PVD氣相沉積設(shè)備 |
AMAT |
Endura CL |
1994 |
電話+微信咨詢 |
1臺(tái)主機(jī)+IMP艙室+2個(gè)艙室+1臺(tái)EFEM; |
國(guó)內(nèi)
|
| 6.23-4019 |
 |
AMAT CENTRIS MESA ETCH沉積蝕刻 |
AMAT |
CENTRIS MESA ETCH |
- |
電話+微信咨詢 |
有2臺(tái)現(xiàn)貨(1個(gè)主機(jī)+3個(gè)雙室,射頻機(jī)器人渦輪配件齊); |
國(guó)內(nèi)
|
| 6.11-4003 |
 |
AMAT Endura II PVD 9個(gè)腔室氣相沉積設(shè)備 |
AMAT |
Endura II PVD 9 |
2007 |
電話+微信咨詢 |
12"設(shè)備完整不缺件,目前設(shè)備在韓國(guó)倉(cāng)庫(kù);
AL 2室、TTN 1室、SIP 2室、ALPS 1室、PcXT 1室、Degas（STD）2室 |
國(guó)外
|
| 6.11-4002 |
 |
AMAT Endura II PVD 8個(gè)腔室氣相沉積設(shè)備 |
AMAT |
Endura II PVD 8 |
2007 |
電話+微信咨詢 |
12"設(shè)備完整不缺件,目前設(shè)備在韓國(guó)倉(cāng)庫(kù);
SIP 1室、ALPS 3室、PcXT 2室、Degas(DMD)2室 |
國(guó)外
|
| 5.27-3918 |
|
AMAT Centura 5200刻蝕機(jī) |
AMAT |
Centura 5200 |
- |
電話+微信咨詢 |
設(shè)備完整不缺件,8英寸3腔表觀系統(tǒng); |
國(guó)外
|
| 1.31-3798 |
|
AMAT P5000刻蝕機(jī) |
AMAT應(yīng)用材料 |
P5000 |
1996 |
電話+微信咨詢 |
CVD 3chamber;nitride
CVD 4chamber;Teos hot box type
Etch mxp 3chamber |
國(guó)外
|
| 12.27-3727 |
|
AMAT 8330干法刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
1990.7 |
電話+微信咨詢 |
6"最大1801W,18片/爐,機(jī)械手傳片; |
國(guó)內(nèi)
|
| 12.27-3726 |
|
AMAT 8330干法刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
1991.4 |
電話+微信咨詢 |
6"最大1801W,18片/爐,機(jī)械手傳片; |
國(guó)內(nèi)
|
| 12.27-3725 |
|
AMAT 8310干法刻蝕機(jī) |
AMAT應(yīng)用材料 |
8310 |
1988.6 |
電話+微信咨詢 |
6"最大1801W,18片/爐,機(jī)械手傳片; |
國(guó)內(nèi)
|
| 12.27-3724 |
|
AMAT AMS-2100干法刻蝕機(jī) |
AMAT應(yīng)用材料 |
AMS-2100 |
- |
電話+微信咨詢 |
在線熱機(jī); |
國(guó)內(nèi)
|
| 12.27-3734 |
|
AMAT 8330干法刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
1988.8 |
電話+微信咨詢 |
6"最大1801W,18片/爐,機(jī)械手傳片; |
國(guó)內(nèi)
|
| 12.27-3733 |
|
AMAT 8330干法刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
1990.2 |
電話+微信咨詢 |
6"最大1801W,18片/爐,機(jī)械手傳片; |
國(guó)內(nèi)
|
| 12.27-3732 |
|
AMAT 8310干法刻蝕機(jī) |
AMAT應(yīng)用材料 |
8310 |
1990 |
電話+微信咨詢 |
6"最大1801W,18片/爐,機(jī)械手傳片; |
國(guó)內(nèi)
|
| 12.27-3731 |
|
AMAT 8310干法刻蝕機(jī) |
AMAT應(yīng)用材料 |
8310 |
1992.6 |
電話+微信咨詢 |
6"最大1801W,18片/爐,機(jī)械手傳片; |
國(guó)內(nèi)
|
| 12.27-3730 |
|
AMAT 8310干法刻蝕機(jī) |
AMAT應(yīng)用材料 |
8310 |
1991.5 |
電話+微信咨詢 |
6"最大1801W,18片/爐,機(jī)械手傳片; |
國(guó)內(nèi)
|
| 12.27-3729 |
|
AMAT 8330干法刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
1990.5 |
電話+微信咨詢 |
6"最大1801W,18片/爐,機(jī)械手傳片; |
國(guó)內(nèi)
|
| 12.27-3728 |
|
AMAT 8330干法刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
1990.7 |
電話+微信咨詢 |
6"最大1801W,18片/爐,機(jī)械手傳片; |
國(guó)內(nèi)
|
| 12.27-3735 |
|
AMAT 8330干法刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
- |
電話+微信咨詢 |
6"最大1801W,18片/爐,機(jī)械手傳片,備件機(jī); |
國(guó)內(nèi)
|
| 9.9-2828 |
|
YAMATO DKN402烤箱 |
YAMATO |
DKN402 |
- |
電話+微信咨詢 |
- |
國(guó)外
|
| 3.22-2656 |
|
AMAT 8330刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
1990.2 |
電話+微信咨詢 |
在購(gòu)熱機(jī) 6" 刻AL;18片/爐;最大1800W;機(jī)械手傳片 |
國(guó)外
|
| 3.22-2657 |
|
AMAT 8310刻蝕機(jī) |
AMAT應(yīng)用材料 |
8310 |
1992.6 |
電話+微信咨詢 |
在購(gòu)熱機(jī) 6" 刻壓點(diǎn);18片/爐;最大1800W;機(jī)械手傳片 |
國(guó)外
|
| 3.22-2658 |
|
AMAT 8310刻蝕機(jī) |
AMAT應(yīng)用材料 |
8310 |
1991.5 |
電話+微信咨詢 |
在購(gòu)熱機(jī) 6" 刻壓點(diǎn);18片/爐;最大1800W;機(jī)械手傳片 |
國(guó)外
|
| 3.22-2660 |
|
AMAT 8330刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
1990.5 |
電話+微信咨詢 |
在購(gòu)熱機(jī) 6" 刻AL;18片/爐;最大1800W;機(jī)械手傳片 |
國(guó)外
|
| 3.22-2661 |
|
AMAT 8330刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
1990.7 |
電話+微信咨詢 |
在購(gòu)熱機(jī) 6" 刻AL;18片/爐;最大1800W;機(jī)械手傳片 |
國(guó)外
|
| 3.22-2662 |
|
AMAT 8330刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
1990.7 |
電話+微信咨詢 |
在購(gòu)熱機(jī) 6" 刻AL;18片/爐;最大1800W;機(jī)械手傳片 |
國(guó)外
|
| 3.22-2663 |
|
AMAT 8330刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
1991.4 |
電話+微信咨詢 |
在購(gòu)熱機(jī) 6" 刻AL;18片/爐;最大1800W;機(jī)械手傳片 |
國(guó)外
|
| 3.22-2664 |
|
AMAT 8310刻蝕機(jī) |
AMAT應(yīng)用材料 |
8310 |
1988.6 |
電話+微信咨詢 |
在購(gòu)熱機(jī) 6" 刻壓點(diǎn);18片/爐;最大1800W;機(jī)械手傳片 |
國(guó)外
|
| 3.22-2655 |
|
AMAT 8330刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
1988.8 |
電話+微信咨詢 |
在購(gòu)熱機(jī) 6" 刻AL;18片/爐;最大1800W;機(jī)械手傳片 |
國(guó)外
|
| 3.19-2470 |
|
AMAT 7700外延爐 |
AMAT應(yīng)用材料 |
7700 |
- |
電話+微信咨詢 |
6"有2臺(tái); |
國(guó)內(nèi)
|
| 3.19-2523 |
|
AMAT 8110刻蝕機(jī) |
AMAT應(yīng)用材料 |
8110 |
- |
電話+微信咨詢 |
6"有1臺(tái); |
國(guó)內(nèi)
|
| 3.19-2524 |
|
AMAT 8330刻蝕機(jī) |
AMAT應(yīng)用材料 |
8330 |
- |
電話+微信咨詢 |
6"有1臺(tái); |
國(guó)內(nèi)
|
| 3.19-2471 |
|
AMAT AMC 7811外延爐 |
AMAT |
AMC-7811 |
- |
電話+微信咨詢 |
6"有8臺(tái) |
國(guó)內(nèi)
|
| 2.8-2427 |
|
AMAT MATERIALS CENTURA ENABLER干法刻蝕設(shè)備 |
AMAT應(yīng)用材料 |
MATERIALS CENTURA ENABLER |
2008 |
電話+微信咨詢 |
System
AC Rack
Monitor
Missing robots
2008 vintage. |
國(guó)外
|
| 2.8-2425 |
|
AMAT MATERIALS Centura HTF EPI外延沉積 |
AMAT應(yīng)用材料 |
MATERIALS Centura HTF EPI Syst |
- |
電話+微信咨詢 |
美國(guó)已下線 |
國(guó)外
|
| 11.2-2373 |
|
AMAT Centura Ultima HDP等離子化學(xué)氣相沉積 |
AMAT應(yīng)用材料 |
Centura Ultima HDP |
- |
電話+微信咨詢 |
8 As-is |
國(guó)外
|
| 11.2-2374 |
|
AMAT Amat Centura2 DSP等離子化學(xué)氣相沉積 |
AMAT應(yīng)用材料 |
Amat Centura2 DSP |
- |
電話+微信咨詢 |
8 As-is |
國(guó)外
|
| 11.2-2371 |
|
AMAT Centura2 DPS+Poly Etch干法蝕刻機(jī) |
AMAT應(yīng)用材料 |
Centura2 DPS+Poly Etch |
- |
電話+微信咨詢 |
8 As-is |
國(guó)外
|
| 11.2-2346 |
|
AMAT P5000 PLIS刻蝕機(jī) |
AMAT應(yīng)用材料 |
P5000 PLIS |
- |
電話+微信咨詢 |
翻新機(jī)Standard TEOS USG x3 Chamber |
國(guó)外
|
| 11.2-2372 |
|
AMAT Centura Ultima等離子化學(xué)氣相沉積 |
AMAT應(yīng)用材料 |
Centura Ultima |
- |
電話+微信咨詢 |
8 As-is |
國(guó)外
|
| 11.2-2397 |
|
AMAT P5000刻蝕機(jī) |
AMAT應(yīng)用材料 |
P5000 |
- |
電話+微信咨詢 |
8 REFURB |
國(guó)外
|
| 11.2-2410 |
|
AMAT mirra MESA CMP化學(xué)機(jī)械拋光設(shè)備 |
AMAT |
mirra MESA CMP |
- |
電話+微信咨詢 |
FULL REPUB |
國(guó)外
|
| 11.2-2413 |
|
AMAT Producer-GT CVD化學(xué)氣相沉積 |
AMAT應(yīng)用材料 |
Producer-GT CVD |
- |
電話+微信咨詢 |
As-is |
國(guó)外
|
| 7.16-2331 |
|
AMAT Producer GT CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer GT |
2007 |
電話+微信咨詢 |
晶圓尺寸：300mm
生產(chǎn)者 GT： 配置
FI：5.4
服務(wù)器：IBM 306m FI
機(jī)器人：Kawasaki x2ea FI
機(jī)器人控制器：Kawasaki x2ea(型號(hào)：30D61H-A203)
加載端口：4 端口
|
國(guó)外
|
| 7.15-2330 |
|
AMAT Producer GT CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer GT |
2008 |
電話+微信咨詢 |
晶圓尺寸：300mm
生產(chǎn)者GT：配置FI
類型：SFEM(制造商：MATTSON)
FI 機(jī)器人：SFEM Dual BladeType
FI 機(jī)器人控制器：未知
負(fù)載端口：2 端口
計(jì)量：NA UPS：Powerwa |
國(guó)外
|
| 7.7-2327 |
|
AMAT P5000刻蝕機(jī) |
AMAT應(yīng)用材料 |
P5000 |
- |
電話+微信咨詢 |
2CH / 3CH |
國(guó)外
|
| 6.15-2303 |
|
AMAT Vera SEM 3D測(cè)量系統(tǒng) |
AMAT應(yīng)用材料 |
Vera SEM 3D |
- |
電話+微信咨詢 |
Metrology |
國(guó)外
|
| 6.15-2302 |
|
AMAT Vera SEM 3D測(cè)量系統(tǒng) |
AMAT應(yīng)用材料 |
Vera SEM 3D |
- |
電話+微信咨詢 |
Metrology |
國(guó)外
|
| 5.26-2270 |
|
AMAT P5000刻蝕機(jī) |
AMAT應(yīng)用材料 |
P5000 |
1995 |
電話+微信咨詢 |
2 chambers CVD
3 chambers CVD |
國(guó)外
|
| 5.24-2260 |
|
AMAT Centura AP Minos Polysili蝕刻機(jī) |
AMAT |
Centura AP Minos Polysili |
- |
電話+微信咨詢 |
- |
國(guó)內(nèi)
|
| 5.24-2261 |
|
AMAT Centura 5200刻蝕機(jī) |
AMAT |
Centura 5200 |
- |
電話+微信咨詢 |
CVD System,6"(3)Chambers. |
國(guó)外
|
| 4.28-1987 |
|
AMAT MATERIALS CENTURA AP MINOS蝕刻機(jī) |
AMAT應(yīng)用材料 |
APPLIED MATERIALS CENTURA AP M |
- |
電話+微信咨詢 |
- |
國(guó)外
|
| 4.13-1981 |
|
AMAT 8310氧化物蝕刻器 |
AMAT應(yīng)用材料 |
8310 |
- |
電話+微信咨詢 |
8" |
國(guó)外
|
| 3.20-1963 |
|
AMAT P5000刻蝕機(jī) |
AMAT應(yīng)用材料 |
P5000 |
- |
電話+微信咨詢 |
- |
國(guó)內(nèi)
|
| 10.1-843 |
|
AMAT Centura DPS2 Metal Etch等離子體蝕刻設(shè)備 |
AMAT |
Centura DPS2 Metal |
2005 |
電話+微信咨詢 |
EFEM(Server, Kawasaki), 3x G2 Metal, AC Rack, 1x Side Storage, 2x SMC Chiller, 3x Cathode Chiller, Utility Box, Tote |
國(guó)外
|
| 10.1-842 |
|
AMAT Centura eMax CT+ Etch蝕刻機(jī) |
AMAT |
Centura eMax CT+ |
2007 |
電話+微信咨詢 |
12"設(shè)備完整不缺件; |
國(guó)外
|
| 10.1-837 |
|
AMAT Producer SE CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer SE |
2009 |
電話+微信咨詢 |
2x BDII 1x UV Cure |
國(guó)外
|
| 10.1-833 |
|
AMAT Centura eMax CT+ Etch蝕刻機(jī) |
AMAT |
Centura eMax CT+ |
2007 |
電話+微信咨詢 |
8"缺件; |
國(guó)外
|
| 10.1-831 |
|
AMAT Centura DPS Metal Etch刻蝕機(jī) |
AMAT |
Centura DPS Metal |
1996 |
電話+微信咨詢 |
C1P1, WBLL, 1x Orient, 1x CD, 2x DPS R0, 2x ASP, AC Rack, Modified Generator Rack, Missing: VME Board, Process kit, etc |
國(guó)外
|
| 10.1-846 |
|
AMAT Centura DPS2 Chamber Etch等離子體蝕刻設(shè)備 |
AMAT |
Centura DPS2 Chamber |
- |
電話+微信咨詢 |
DPS2 Poly Chamber, Parts |
國(guó)外
|
| 10.1-968 |
|
AMAT Uvision 4量測(cè)設(shè)備 |
AMAT |
UVision 4 |
- |
電話+微信咨詢 |
Parts Sale Available
If you need any demand for specific parts, please inquire. |
國(guó)外
|
| 10.1-832 |
|
AMAT P5000刻蝕機(jī) |
AMAT |
P5000 |
1996 |
電話+微信咨詢 |
CVD MarkII, 2x DLH_Delta, 2x Etch |
國(guó)外
|
| 10.1-847 |
|
AMAT Centura DPS2 Chamber等離子體蝕刻設(shè)備 |
AMAT |
Centura DPS2 Chamber |
- |
電話+微信咨詢 |
DPS2 Poly Chamber, Parts |
國(guó)外
|
| 10.1-848 |
|
AMAT Centura DPS2 Chamber等離子體蝕刻設(shè)備 |
AMAT |
Centura DPS2 Chamber |
- |
電話+微信咨詢 |
DPS2 Poly Chamber, Parts |
國(guó)外
|
| 10.1-850 |
|
AMAT Centura DPS2 AdvantEdge G等離子體蝕刻設(shè)備 |
AMAT |
Centura DPS2 AdvantEdge G5 Mes |
2007 |
電話+微信咨詢 |
G5 Mesa. EFEM(Server, Kawasaki) 3x G5 Mesa, 1x Axiom, AC Rack, UPS racks, AE Top match, 2x Side Storage, Tote |
國(guó)外
|
| 10.1-902 |
|
AMAT Producer GT CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer GT |
2003 |
電話+微信咨詢 |
Polisher STD, Desica Cleaner |
國(guó)外
|
| 10.1-912 |
|
AMAT Producer SE CVD化學(xué)氣相沉積設(shè)備 |
AMAT應(yīng)用材料 |
Producer SE |
2007 |
電話+微信咨詢 |
3Twin ACL(HF and LF Gen), Server Type, LCF, Power-On Condition |
國(guó)外
|
| 10.1-913 |
|
AMAT Producer SE CVD化學(xué)氣相沉積設(shè)備 |
AMAT應(yīng)用材料 |
Producer SE |
2003 |
電話+微信咨詢 |
2 Twiin( HF_Apex3013, LF_PDX9002V, RPC_FI20620-1), OS_Server Type, LP_TDK 2ea, |
國(guó)外
|
| 10.1-829 |
|
AMAT Producer SE CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer SE |
2004 |
電話+微信咨詢 |
HT-SiN 3 Twin, OS_FES(CGA), FInRT(Longflex Type, CPCI7236), RPC_NPP, Throttle Valve Localized |
國(guó)外
|
| 10.1-915 |
|
AMAT Centura DPS2 532 Metal等離子體蝕刻設(shè)備 |
AMAT應(yīng)用材料 |
Centura DPS2 532 Metal |
2006 |
電話+微信咨詢 |
EFEM(Yaskawa), 2xDPS532, 1xAxiom, AC Rack, Power On condition |
國(guó)外
|
| 10.1-536 |
|
AMAT Centura DPS2 Poly刻蝕機(jī) |
AMAT |
Centura DPS2 Poly |
2007 |
電話+微信咨詢 |
EFEM(Kawasaki, Server), TM, 3x G5 Poly, 1x Axiom, AC Rack, Chiler |
國(guó)外
|
| 10.1-969 |
|
AMAT Uvision 4量測(cè)設(shè)備 |
AMAT |
UVision 4 |
2009 |
電話+微信咨詢 |
[As-is]2ea*TDK load port, Kawasaki Robot, stage locking.
*Parts Sale Available
If you need any demand for specific par |
國(guó)外
|
| 10.1-914 |
|
AMAT Endura II氣相沉積設(shè)備 |
AMAT |
Endura II |
2004 |
電話+微信咨詢 |
EFEM, TM, 2x PCII, 2x IMP, 1x TxZ |
國(guó)外
|
| 10.1-494 |
|
AMAT Centura Enabler Etch刻蝕機(jī) |
AMAT |
Centura Enabler |
2010 |
電話+微信咨詢 |
EFEM(NT, Fixed Kawasaki), TM(VHP), 4x Enabler, AC Rack, RF Rack(ENI Spectrum 11002, GHW-50), 2x Sidestorage, Utility Box |
國(guó)外
|
| 10.1-885 |
|
AMAT Centura DPS2 Poly Etch等離子體蝕刻設(shè)備 |
AMAT應(yīng)用材料 |
Centura DPS2 Poly |
2006 |
電話+微信咨詢 |
EFEM, TM, 3x DPS2 Poly, 1x Axiom, AC Rack |
國(guó)外
|
| 10.1-886 |
|
AMAT Centura DPS2 Poly Etch等離子體蝕刻設(shè)備 |
AMAT應(yīng)用材料 |
Centura DPS2 Poly |
2007 |
電話+微信咨詢 |
EFEM, TM, 3x DPS2 Poly; 1x Axiom, AC Rack, Side Storage, EE-EAS-12 |
國(guó)外
|
| 10.1-463 |
|
AMAT AMC7821外延爐 |
AMAT |
AMC7821 |
2001 |
電話+微信咨詢 |
OEM rebuild aug-2001 Epitaxy |
國(guó)外
|
| 10.1-464 |
|
AMAT AMC7821外延爐 |
AMAT |
AMC7821 |
1983 |
電話+微信咨詢 |
epitaxy |
國(guó)外
|
| 10.1-465 |
|
AMAT AMC7800RPX外延爐 |
AMAT |
AMC7800RPX |
1982 |
電話+微信咨詢 |
Epitaxy |
國(guó)外
|
| 10.1-466 |
|
AMAT AMC7811外延爐 |
AMAT |
AMC-7811 |
1990 |
電話+微信咨詢 |
Epitaxy |
國(guó)外
|
| 10.1-971 |
|
AMAT UVision 5 Metrology光學(xué)檢測(cè)計(jì)量設(shè)備 |
AMAT應(yīng)用材料 |
UVision 5 |
2012 |
電話+微信咨詢 |
2port(TDK TAS300), Yaskawa robot & Aligner, Stage and Granite unlocked, Missing : Stage motor(X-Mirror), HDD
*Parts Sal |
國(guó)外
|
| 10.1-480 |
|
AMAT Orbot WF720晶圓檢測(cè)系統(tǒng) |
AMAT |
Orbot WF720 |
- |
電話+微信咨詢 |
- |
國(guó)外
|
| 10.1-490 |
|
AMAT Producer SE CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer SE |
2007 |
電話+微信咨詢 |
ACL Process, 2 Twin Ch(HF_Apex3013, RPC_MKS AX7685-20), Operation System: Server Type, LCF Option. Missing: loadlock pum |
國(guó)外
|
| 10.1-539 |
|
AMAT Centura Enabler刻蝕機(jī) |
AMAT |
Centura Enabler |
2008 |
電話+微信咨詢 |
EFEM(Server, Yaskawa), TM(VHP), 3x Enabler, AC Rack, RF Rack(ENI B5002, GHW 50A), 1x Side Storage, Parts |
國(guó)外
|
| 10.1-493 |
|
AMAT Centura eMax CT+ Etch蝕刻機(jī) |
AMAT |
Centura eMax CT+ |
2006 |
電話+微信咨詢 |
8"缺件; |
國(guó)外
|
| 10.1-822 |
|
AMAT DPS2 532 Metal Chamber Etch刻蝕機(jī) |
AMAT |
DPS2 532 Metal Chamber |
2004 |
電話+微信咨詢 |
DPS2 532 Metal Chamber only |
國(guó)外
|
| 10.1-497 |
|
AMAT Endura CL PVD氣相沉積設(shè)備 |
AMAT |
Endura CL |
2000 |
電話+微信咨詢 |
EFEM(2 Ports, Kensington), XP Robot, 2x Degas, 1x TTN, 1x AL, 1x ALPS, Cryo Genics Chiller |
國(guó)外
|
| 10.1-517 |
|
AMAT Centura Avatar Etch刻蝕機(jī) |
AMAT |
Centura Avatar |
- |
電話+微信咨詢 |
AVATAR 4x Chamber only |
國(guó)外
|
| 10.1-530 |
|
AMAT Centura Enabler E2刻蝕機(jī) |
AMAT |
Centura Enabler E2 |
2010 |
電話+微信咨詢 |
EFEM(Server, Yaskawa), TM(VHP), 3x Enabler E2, AC Rack(w/CVCF),RF Rack(ENI B5002, GHW 50A), 2x Side Storage, Parts, miss |
國(guó)外
|
| 10.1-534 |
|
AMAT P5000刻蝕機(jī) |
AMAT |
P5000 |
- |
電話+微信咨詢 |
在線熱機(jī),有2臺(tái); |
國(guó)外
|
| 10.1-535 |
|
AMAT Centura AP ISPRINT CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Centura AP ISPRINT |
2008 |
電話+微信咨詢 |
4 xALD W CH, OS_SErver Type, AP Frame |
國(guó)外
|
| 10.1-537 |
|
AMAT Centura DPS2 Poly刻蝕機(jī) |
AMAT |
Centura DPS2 Poly |
2007 |
電話+微信咨詢 |
EFEM(Kawasaki, Server), TM, 3x G5 Poly, 1x Axiom, AC Rack, Chiler |
國(guó)外
|
| 10.1-540 |
|
AMAT Centura Enabler刻蝕機(jī) |
AMAT |
Centura Enabler |
2006 |
電話+微信咨詢 |
EFEM(Server, Yaskawa), TM(VHP), 3x Enabler, AC Rack(w/CVCF, UPS), RF Rack(ENI B5002, GHW 50A), 1x Side Storage, Parts |
國(guó)外
|
| 10.1-541 |
|
AMAT Centura Enabler刻蝕機(jī) |
AMAT |
Centura Enabler |
2006 |
電話+微信咨詢 |
EFEM(NT, Yaskawa, missing Blade), TM(VH), 3x Enabler(Simatsu Turbo), AC Rack, Generator Rack(ENI B5002, missing Spectrum |
國(guó)外
|
| 10.1-546 |
|
AMAT P5000刻蝕機(jī) |
AMAT |
P5000 |
1990 |
電話+微信咨詢 |
CVD Mark1, 3x DLH |
國(guó)外
|
| 10.1-548 |
|
AMAT Producer SE CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer SE |
2006 |
電話+微信咨詢 |
2 Twiin( HF_Apex3013, LF_PDX9002V, RPC_FI20620-1), OS_Server Type, , Heating Jacket_Localized, MFCs_Localized |
國(guó)外
|
| 10.1-492 |
|
AMAT Centura eMax CT+ Etch蝕刻機(jī) |
AMAT |
Centura eMax CT+ |
2004 |
電話+微信咨詢 |
8"缺件; |
國(guó)外
|
| 10.1-1503 |
|
AMAT P5000刻蝕機(jī) |
AMAT |
P5000 |
- |
電話+微信咨詢 |
8" REFURB |
國(guó)外
|
| 10.1-1357 |
|
AMAT Centura Enabler Etch刻蝕機(jī) |
AMAT應(yīng)用材料 |
Centura Enabler |
2007 |
電話+微信咨詢 |
- |
國(guó)外
|
| 10.1-1424 |
|
AMAT Producer GT CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer GT |
2010 |
電話+微信咨詢 |
1 Twin CH(ACL) only |
國(guó)外
|
| 10.1-1425 |
|
AMAT Producer GT CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer GT |
2011 |
電話+微信咨詢 |
3 Twin(HARP USG, RPC_FI80131), FI(TDK_LP x4ea, OS_IBM306M)MFC: Unit125, NF3 15000 cc, Ar 15000 cc, N2 5000 cc, O2 30000 |
國(guó)外
|
| 10.1-1426 |
|
AMAT Centura DPS2 Metal等離子體蝕刻設(shè)備 |
AMAT |
Centura DPS2 Metal |
2005 |
電話+微信咨詢 |
EFEM(Server, Yaskawa), 3x G2 Metal, AC Rack, 1x Side Storage, 2x SMC Chiller, 3x Cathode Chiller, Utility Box, Tote |
國(guó)外
|
| 10.1-1456 |
|
AMAT Vantage 5外延爐 |
AMAT |
Vantage 5 |
2012 |
電話+微信咨詢 |
RTP |
國(guó)外
|
| 10.1-1461 |
|
AMAT Reflexion FA拋光設(shè)備 |
AMAT |
Reflexion FA |
2005 |
電話+微信咨詢 |
CMP |
國(guó)外
|
| 10.1-1464 |
|
AMAT P5000刻蝕機(jī) |
AMAT |
P5000 |
1988 |
電話+微信咨詢 |
CVD Mark1, 3x DLH |
國(guó)外
|
| 10.1-1472 |
|
AMAT Centura Axiom Chamber薄膜沉積設(shè)備 |
AMAT |
Centura Axiom Chamber |
2006 |
電話+微信咨詢 |
Axiom Only (w/VODM) |
國(guó)外
|
| 10.1-1699 |
|
AMAT Centura XE+刻蝕機(jī) |
AMAT應(yīng)用材料 |
Centura XE+ |
2003 |
電話+微信咨詢 |
RTP |
國(guó)外
|
| 10.1-1502 |
|
AMAT P5000刻蝕機(jī) |
AMAT |
P5000 |
- |
電話+微信咨詢 |
FULL REPUB |
國(guó)外
|
| 10.1-1321 |
|
AMAT NanoSEM 3D Metrology掃描電子顯微鏡 |
AMAT |
NanoSEM 3D |
2002 |
電話+微信咨詢 |
ULTIPLE UNITS AVAILBLE. PLEASE INQUIRE.
SEM - Critical Dimension (CD) Measurement
Currently configured for 300mm wafe |
國(guó)外
|
| 10.1-1504 |
|
AMAT mirra MESA CMP化學(xué)機(jī)械拋光設(shè)備 |
AMAT |
mirra MESA CMP |
- |
電話+微信咨詢 |
FULL REPUB |
國(guó)外
|
| 10.1-1505 |
|
AMAT Producer-GT CVD化學(xué)氣相沉積 |
AMAT應(yīng)用材料 |
Producer-GT CVD |
- |
電話+微信咨詢 |
As-is |
國(guó)外
|
| 10.1-1506 |
|
AMAT Centura DPS+Poly Etch等離子體蝕刻設(shè)備 |
AMAT |
Centura DPS+Poly Etch |
- |
電話+微信咨詢 |
As-is |
國(guó)外
|
| 10.1-884 |
|
AMAT Centura DPS2 Poly Etch等離子體蝕刻設(shè)備 |
AMAT應(yīng)用材料 |
Centura DPS2 Poly |
2006 |
電話+微信咨詢 |
EFEM(Kawasaki, Server), TM, 3x G5, 1x Axiom(No VODM), AC Rack, Chiller |
國(guó)外
|
| 10.1-1700 |
|
AMAT Centura XE刻蝕機(jī) |
AMAT應(yīng)用材料 |
Centura XE |
2003 |
電話+微信咨詢 |
RTP |
國(guó)外
|
| 10.1-1701 |
|
AMAT Centura MXP刻蝕機(jī) |
AMAT應(yīng)用材料 |
Centura MXP |
1997 |
電話+微信咨詢 |
ETCH |
國(guó)外
|
| 10.1-1702 |
|
AMAT Centura DXZ刻蝕機(jī) |
AMAT應(yīng)用材料 |
Centura DXZ |
1999 |
電話+微信咨詢 |
CVD |
國(guó)外
|
| 10.1-1703 |
|
AMAT Centura DPS刻蝕機(jī) |
AMAT應(yīng)用材料 |
Centura DPS |
1998 |
電話+微信咨詢 |
ETCH |
國(guó)外
|
| 10.1-1704 |
|
AMAT AKT-3500蝕刻機(jī) |
AMAT應(yīng)用材料 |
AKT-3500 |
2018 |
電話+微信咨詢 |
CVD |
國(guó)外
|
| 10.1-1473 |
|
AMAT Centura DPS2 Metal等離子體蝕刻設(shè)備 |
AMAT |
Centura DPS2 Metal |
2005 |
電話+微信咨詢 |
EFEM(NT, Yaskawa), 3x G2 Metal, 1x Axiom(VODM), AC Rack, 1x Side Storage, 3x SMC Chiller, 2x Cathode Chiller, Utility Bo |
國(guó)外
|
| 10.1-1266 |
|
AMAT Centura Carina Chamber Etch刻蝕機(jī) |
AMAT |
Centura Carina Chamber |
- |
電話+微信咨詢 |
Chamber Only.
Carina Etch Chamber.
Chamber Materials: ADVANCED CERAMIC
Lid Materials: AG 1000
Process Ring: QUARTZ |
國(guó)外
|
| 10.1-1008 |
|
AMAT Endura CL PVD氣相沉積設(shè)備 |
AMAT |
Endura CL |
2004 |
電話+微信咨詢 |
EFEM(2Ports, Kensington), , 2x AC Rack, 1x Gen Rack, 1x Transformer, 2x Compressor, NO Cables |
國(guó)外
|
| 10.1-1172 |
|
AMAT Octane G2 assy氣相沉積 |
AMAT應(yīng)用材料 |
Octane G2 assy |
1999 |
電話+微信咨詢 |
- |
國(guó)外
|
| 10.1-1173 |
|
AMAT Octane G2 assy氣相沉積 |
AMAT應(yīng)用材料 |
Octane G2 assy |
1999 |
電話+微信咨詢 |
- |
國(guó)外
|
| 10.1-1210 |
|
AMAT Producer GT CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer GT |
2017 |
電話+微信咨詢 |
Frontier FRONTIER etch for Junctions - CHA-SiCoNi, CHC-Frontier |
國(guó)外
|
| 10.1-1211 |
|
AMAT Producer GT CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer GT |
2015 |
電話+微信咨詢 |
Frontier FRONTIER etch for Junctions - CHA-SiCoNi, CHB-Frontier, CHC-Frontier |
國(guó)外
|
| 10.1-1212 |
|
AMAT Producer GT CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer GT |
2016 |
電話+微信咨詢 |
Frontier FRONTIER etch for Junctions - CHA-SiCoNi, CHB-Frontier, CHC-Frontier |
國(guó)外
|
| 10.1-1213 |
|
AMAT Producer GT CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer GT |
2015 |
電話+微信咨詢 |
3 Chamber: 1x SiCoNi PME, Frontier SMR Nitride, Frontier SMR Poly |
國(guó)外
|
| 10.1-1220 |
|
AMAT NanoSEM 3D Metrology掃描電子顯微鏡 |
AMAT |
NanoSEM 3D |
2004 |
電話+微信咨詢 |
Installed. Operational. |
國(guó)外
|
| 10.1-1221 |
|
AMAT NanoSEM 3D Metrology掃描電子顯微鏡 |
AMAT |
NanoSEM 3D |
2004 |
電話+微信咨詢 |
Installed. Operational. |
國(guó)外
|
| 10.1-1329 |
|
AMAT Centura Chamber刻蝕機(jī) |
AMAT應(yīng)用材料 |
Centura Chamber |
2010 |
電話+微信咨詢 |
2 x Minos, 1 x Carina, 1 x Axion, Connected in a fab,), SW B2.870_gB7.50_37 |
國(guó)外
|
| 10.1-1226 |
 |
AMAT Endura II PVD氣相沉積設(shè)備 |
AMAT |
Endura II |
2006 |
電話+微信咨詢 |
1x DSTTN |
已售
|
| 10.1-1322 |
|
AMAT NanoSEM 3D Metrology掃描電子顯微鏡 |
AMAT |
NanoSEM 3D |
2002 |
電話+微信咨詢 |
MULTIPLE UNITS AVAILABLE. PLEASE INQUIRE.
SEM - Critical Dimension (CD) Measurement
Currently configured for 300mm wa |
國(guó)外
|
| 10.1-1274 |
|
AMAT UVision 5 Metrology光學(xué)檢測(cè)計(jì)量設(shè)備 |
AMAT |
UVision 5 |
2012 |
電話+微信咨詢 |
300mm G1 Load Port 2
Moving Monron V640 - Carrier ID Reader 2
EMULATOR V7.5 (Upgraded UV) 1
IBA and Virtual Recipe Co |
國(guó)外
|
| 10.1-1275 |
|
AMAT UVision 5 Metrology光學(xué)檢測(cè)計(jì)量設(shè)備 |
AMAT |
UVision 5 |
2011 |
電話+微信咨詢 |
- |
國(guó)外
|
| 10.1-1276 |
|
AMAT ACMS0XT-ASG-E Component清洗設(shè)備 |
AMAT |
ACMS0XT-ASG-E |
2006 |
電話+微信咨詢 |
- |
國(guó)外
|
| 10.1-1277 |
|
AMAT ACMS XT II Component晶圓清洗 |
AMAT |
ACMS XT II |
2005 |
電話+微信咨詢 |
- |
國(guó)外
|
| 10.1-1280 |
|
AMAT Olympia CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Olympia |
2015 |
電話+微信咨詢 |
2Ch ALD System, Single chamber, In a fab, warm idle |
國(guó)外
|
| 10.1-1301 |
|
AMAT Producer GT CVD化學(xué)氣相沉積設(shè)備 |
AMAT |
Producer GT |
2014 |
電話+微信咨詢 |
Parts Machine: 1 x Proudcer GT chamber
MISSING PARTS
UPS batteries or battery pack Qty / Units
missing door inte |
國(guó)外
|
| 10.1-1310 |
|
AMAT Vantage Vulcan外延爐 |
AMAT |
Vantage Vulcan |
2013 |
電話+微信咨詢 |
2 Chamber RTP System |
國(guó)外
|
| 10.1-1311 |
|
AMAT Centura Enabler Chamber蝕刻機(jī) |
AMAT |
Centura Enabler Chamber |
2004 |
電話+微信咨詢 |
Condition : Very Good , CE Marked : YES , Dry Etch, Bx-, Cx-, E1 layers, 300mm wafers, 32nm BD/SICOH Etch ,MULTIPLE UNI |
國(guó)外
|
| 10.1-1007 |
|
AMAT Endura CL PVD氣相沉積設(shè)備 |
AMAT |
Endura CL |
2004 |
電話+微信咨詢 |
EFEM(2Ports, Kensington), 1x Gen Rack, Compressor, 1x AC Rack, VHP missing, No cables |
國(guó)外
|
| 10.1-1222 |
|
AMAT NanoSEM 3D Metrology掃描電子顯微鏡 |
AMAT |
NanoSEM 3D |
2004 |
電話+微信咨詢 |
Installed. Operational. LoadportX3 |
國(guó)外
|
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